Magnetron sputter

Instrument name

Magnetron Sputter

Model

PVD75

Manufacturer

KURT J.LESKER COMPANY

Specifications

1.There are three sputtering targets with 2 diameter,

and one of them could sputter ferro magnetic material.

2.Power Supply: RF and DC Power Supply

3.Shutter: There are 3 source shutter and 1 substrate

shutter

4.Ultimate Vacuum: 5*10-5 Pa; Work Background Vacuum: 7*10-4 Pa；

5.Platen Size: Up to 4 diameter

6.Heating: ≤500℃

7.System Control: PC+PLC Control

Function and applications

Magnetron sputter is a universal metal coating machine, used for depositing of single-layer or multi-layer metal film. It could be mainly used for the metal, semiconductor, oxide et. al. electrodes preparation in the field of nano-device and organic photoelectric device.

Accessories

Mechanical Pump

Contacts: Wenchang Zhu

Contact number:65881259

E-mail: wczhu@suda.edu.cn