Plasma Cleaner

Instrument name

Plasma Cleaner

Model

IoN 40

Manufacturer

PVA Tepla America Inc

Specifications

1.Reaction chamber: Size 229 mm*330 mm*483 mm；

2.Process Gas: O2 and Ar;

3.Vacuum System: pre-condition 50mTorr; Process Pressure 120-2000mTorr

4.RF Power: Frequency 13.56MHZ, Power Adjust Range is 0-300W.

5.Control System: Automatic Control

Function and applications

The PVA TePla ION Series Plasma Processing System is a batch-mode plasma system for etch, strip, clean, and surface treatment, which could be widely used in the field of semiconductor technology and biotechnology. It combines field-proven features, which minimize machine-generated particulate with the process flexibility of computer control.

Accessories

Dry Pump

Contacts: Wenchang Zhu

Contact number:65881259

E-mail: wczhu@suda.edu.cn